๐ ๐ถ๐๐๐ฒ๐ฑ ๐๐ต๐ฒ ๐น๐ถ๐๐ฒ ๐๐ฒ๐๐๐ถ๐ผ๐ป? ๐ง๐ต๐ฒ ๐๐ฒ๐ฏ๐ถ๐ป๐ฎ๐ฟ ๐ฟ๐ฒ๐ฝ๐น๐ฎ๐ ๐ถ๐ ๐ป๐ผ๐ ๐ฎ๐๐ฎ๐ถ๐น๐ฎ๐ฏ๐น๐ฒ !
In this seminar, ASML and imec reflect on some of the technical challenges they faced and the perseverance needed to develop Extreme Ultra Violet (EUV) lithography. Additionally, both organizations provide insights on the future of EUV lithography.
It has taken more than 20 years to go from the initial concept of EUV lithography to high-volume manufacturing. IPCEI funding and related European collaborations have played, and continue to play, an integral role in the development of next-generation semiconductors, which are crucial in keeping Mooreโs Law alive.
Agenda Overview
This seminar will provide valuable insights into the evolution of EUV lithography, the challenges overcome, and how collaboration drives the future of semiconductor technology.
- Introduction (5 minutes)
Speaker: Mirelle Ter Veer, PhD / Program Leader Innovation ABGi France
An overview of the webinar's objectives, format, and introduction of the speakers and topics.
- Semiconductor Industry
- Mooreโs law
- Road to EUV Lithography
- Role of European collaborations
- Imecโs innovation model
- High-NA process development at Imec
- Next steps in keeping Mooreโs law alive.
- Closing statements
- Q&A Session (15 minutes)
An interactive Q&A session where participants can engage directly with our speakers to further explore the topics discussed.
Speakers
- Greet STORMS
Greet Storms, Senior Vice President at ASML and Head of Product Management EXE, has been shaping lithography and metrology innovations for over 15 years. Since joining ASML in 2008, she has held key roles in metrology, imaging, and process control.
- Arno KRUK
Arno Kruk is Public Partnership Manager in the Government & External Affairs team at ASML. In this role he engages with various European and Dutch public funding opportunities to strengthen the European Semiconductor ecosystem. In ASML Arno is leading the IPCEI ME/CT project.
- Steven SCHEER
Steven Scheer, Senior Vice President of Compute Technologies & Systems at imec, drives advancements in logic, memory, 3D integration, and advanced patterning. He built a 20-year career spanning IBM, Tokyo Electron, and imec, where he has led innovations in patterning and materials since 2019.